INL accelerates the development of applications with a new nanoimprint system

October 24, 2018

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INL – International Iberian Nanotechnology Laboratory has purchased an Eitre 8 NIL nanoimprint system from Obducat, a leading supplier of lithography solutions based on nanoimprint lithography (NIL). This investment reinforces INL high-end equipment portfolio and consequently its ability to provide better and faster outcomes.

This nanoimprint system will be installed in the INL cleanroom facilities. With its high-throughput and high yield capabilities of replicating nanostructures at the 200 mm wafer-scale, this lithography system will allow to significantly reduce process and development times for INL and its partners. It will be used for a broad range of applications, covering fields in optics, nanosensors and surfaces with very special functions, to name a few.

The EITRE system is scheduled to be delivered to INL during the fourth quarter this year.